Lamp illumination
UVcompactfor microscopy

lamp illumination
lamp illumination
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Illumination technology
Other characteristics
Technical applications
for microscopy, inspection

Max.: 1,000 nm

Min.: 250 nm


Hg-Xe mixed gas discharge lighting consisting of lamp house with integrated ignition and ballast. With LEJ Deep UV lighting system, you will get extremely stable UV radiation due to the low thermal drift and very stable DC power supply from our ballast. - Furthermore, our system enables a reproducible mechanical adjustment of lamp, mirror and collector. Thus, the LEJ Deep-UV system is suitable for wafer inspection or for illumination during optical review and analysis of photomasks, especially of structures and linewidths for defects and flaws. Product Highlights no thermal drift reproducible mechanical adjustment Integrated high voltage ignition Safety circuit function Operating hours counter Application areas Photomask analysis Disinfection UV curing


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