Laser lithography system Quantum X

Nanoscribe Quantum X is the world's first Two-Photon Grayscale Lithography system for maskless microfabrication of refractive and diffractive microoptics Experience the new Quantum X The brand-new Nanoscribe Quantum X system is designed for the microfabrication of prototypes and masters in industrial production processes. This maskless lithography system redefines the fabrication of free-form microoptics, microlens arrays and multi-level diffractive optical elements. The world’s first Two-Photon Grayscale Lithography (2GL ®) system combines the extraordinary performance of grayscale lithography with the precision and flexibility of Nanoscribe’s pioneering Two-Photon Polymerization technology. Quantum X offers high speed, full design freedom and the precision needed for additive fabrication of complex structures requiring high shape accuracy and ultra-smooth surfaces. Fast and accurate additive manufacturing processes drastically shorten design iteration cycles and enable cost-effective microfabrication. Two-Photon Grayscale Lithography This breakthrough technology combines additive microfabrication with ultra-fast voxel size tuning: Two-Photon Grayscale Lithography (2GL) paves the way for ultra-fast, accurate and free-form microfabrication without compromising speed or accuracy. Quantum X controls the voxel size along one scanning plane using synchronized laser power modulation at high speeds. In this manner, complex shapes are produced and variable feature heights are achievable within one scan field.