Product overviewAnnular diamond wire is an annular cutting tool manufactured by electrodepositing diamond abrasive onto a steel or tungsten ring wire with nickel as binder. It is intended for precision cutting of hard, brittle materials with high efficiency, notably monocrystalline and polycrystalline silicon cropping/squaring in photovoltaic production, as well as graphite, sapphire and other hard-brittle substrates.
Key features- Electrodeposited diamond abrasive bonded on annular steel or tungsten wire
- Available diameters: 380 μm, 420 μm, 500 μm, 650 μm, 800 μm
- Diameter tolerance: ±50 μm
- Tungsten ring-wire variants to reduce cutting loss and cost
- Customization and R&D support to meet process requirements
Product specifications (examples)- 800 μm annular wire — diameter 800±50 μm; breaking force >410 N; tensile strength ≈810 N/mm²; typical use: graphite processing
- 650 μm annular wire — diameter 650±50 μm; breaking force >260 N; tensile strength ≈780 N/mm²; typical use: graphite processing
- 500 μm annular wire — diameter 500±50 μm; breaking force >230 N; tensile strength ≈1120 N/mm²; typical use: crystal silicon cropping/squaring
- 420 μm annular wire — diameter 420±50 μm; breaking force >210 N; tensile strength ≈1240 N/mm²; typical use: crystal silicon cropping/squaring
- 420 μm tungsten ring-wire — diameter 420±50 μm; breaking force >230 N; tensile strength ≈1490 N/mm²; typical use: crystal silicon cropping/squaring
- 380 μm tungsten ring-wire — diameter 380±50 μm; breaking force >190 N; tensile strength ≈1372 N/mm²; typical use: crystal silicon cropping/squaring
Applications and ordering- Main applications: photovoltaic wafer cropping/squaring, graphite and semiconductor slicing, sapphire processing and other hard-brittle material cutting
- Selection guidance: choose diameter and wire material based on target material, required surface finish and line speed
- Supply options: standard diameters available; custom diameters and bonding specifications available on request