Infrared microscope NIR

for researchfor semiconductorsnear-infrared

Overview
This NIR microscope is configured for near‑infrared imaging of silicon wafers from the back side. The dataset and demonstrations focus on wavelength comparison and basic image processing workflows useful for semiconductor inspection and research.

Evaluation video
The evaluation video presents a timeline of back-side wafer imaging and image-processing examples:

• 0 sec: Back side surface of silicon wafer
• 7 sec: 1100 nm pattern image
• 16 sec: 1100 nm pattern image after image processing
• 27 sec: 1300 nm pattern image
• 38 sec: 1550 nm pattern image

Comparison images
Side-by-side comparison of back-side silicon wafer images acquired at 1100 nm, 1300 nm, 1450 nm and 1550 nm to illustrate contrast and feature visibility across wavelengths.

Images included

• Image carousel with multiple slides showing microscope and wafer images (Slide1 to Slide16)
• Comparison images labeled bawah1, bawah2, bawah3 illustrating back-side silicon wafer patterns

Technical specifications

• Imaging wavelengths compared: 1100 nm, 1300 nm, 1450 nm, 1550 nm
• Includes image processing demonstration (example at 16 sec in the evaluation video)
• Visual materials: multi-slide image carousel plus labeled comparison files
• Demonstration video available showing timeline and processed results of NIR imaging