Removed impurities: H2O, O2, CO, CO2, CnHm
• Purification process: chemisorption + adsorption
• Principle: The gas passes through a special catalyst and an adsorbent layer where impurities are removed.
• Main domain of use: semi-conductor industry, welding gas, protective gases….
Technical information:
• Pressure: up to 380 barg
• Outlet impurity level: < 10 ppb Semi automatic or automatic version (HMI/PLC)