Removed impurities: H2O, O2, CO, CO2
• Purification process: chemisorption + adsorption
• Principle: The gas passes through a special catalyst and adsorbent layer where impurities are removed.
• Main domain of use: gas industries (conditioning).
Technical information:
• Pressure: up to 380 barg
• Outlet impurity level: < 10 ppb
• Manual or semi-automatic version (HMI/PLC)