TYPICAL APPLICATION
Transmission Scanning Electron Microscope,Scanning Electron Microscope,Semiconductor analysis,Processing and repair,Ion beam etching,Focused ion beam lithography,Accelerator power
The HEM series of Wisman high-voltage power supplies is a comprehensive multi-output high-voltage power supply dedicated to focusing ion beams. Typical applications include transmission and scanning electron microscopy; semiconductor analysis, milling and repair of optical drive heads, ions; beam etching and focused ion beam lithography. The modular design method allows individual components to be easily configured and assembled on a large chassis in a common rack. Interface, logic and control circuits are surface mount technology to minimize cost and size. Integrate acceleration power supply, filament power supply, absorb polar power, inhibit polar power and lens power. Ultra-low output ripple, excellent adjustment rate, stability, temperature drift and accuracy. Patented high-voltage suspension and digital control technology. The HEM series of high-precision modules are competitively priced and are ideal for OEM applications.
Ripple: 70 mV P-P, from 0.1 Hz to 1MHZ
Line regulation: input change + / -10% for 100mV
Load regulation : ± 0.01%, maximum voltage, full load change
Stability: after 2 hours of warm-up, 1.5V/10 hours
Temperature coefficient: 25 PPM / °C
Filament power supply
Ripple: 10mA P-P, from 0.1 Hz to 1MHZ
Line regulation: + / -10% change to 5mA
Load regulation: ± 0.1%, maximum voltage, full load change
Stability: 5mA/10 minutes after warming up for 2 hours
Temperature coefficient: 200 PPM / °C