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Clean room cleaning wipe
NSF E4

Clean room cleaning wipe - Shanghai Danmajet Digital Tech Co.,Ltd - NSF E4
Clean room cleaning wipe - Shanghai Danmajet Digital Tech Co.,Ltd - NSF E4
Clean room cleaning wipe - Shanghai Danmajet Digital Tech Co.,Ltd - NSF E4 - image - 2
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Characteristics

Applications
for clean rooms
Certifications
NSF E4

Description

Engineered for critical printing system maintenance, our ultra-low-lint wipes deliver uncompromising performance with: - 0.3 μm particle retention (per IEST-RP-CC004.3) - Class 1 cleanroom certification (ISO 14644-1) - Electrostatic discharge protection (10^9 ohms/sq) Material Science Advantages - Bidirectional Knit Structure: 70% polyester / 30% nylon composite - 12% stretchability for contour following - 8.2 mg/cm absorbency rate Product Features: - Designed for precision printhead maintenance in cleanroom environments - Ultra-low-lint to prevent contamination - High absorbency for effective cleaning - Electrostatic discharge protection to safeguard sensitive components - Flexible and stretchable for thorough cleaning of complex surfaces Technical Specifications: - Particle Retention: 0.3 μm (per IEST-RP-CC004.3) - Cleanroom Certification: ISO 14644-1 Class 1 - Electrostatic Resistance: 10^9 ohms/sq - Material: 70% polyester / 30% nylon - Stretchability: 12% - Absorbency Rate: 8.2 mg/cm

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