PVD deposition machine C60EP

thermal evaporationthin-filmmetalized film

Induction heating is widely used in different fields due to high process productivity and universality, cleanness and possibility of full automation. As one method of PVD thermal evaporation technology, the process is environmentally friendly. Since the induction allows reaching temperature of 2000℃ and more, this method is very suitable for industrial production and scientific researches. The RTEP0404 Induction Evaporation Coating Machine is designed for C60 evaporating deposition on varies of materials. C60 manufactures provides R&D and testing results for prospective. A strong tool assisting them to expand new applied industries. Main Applications: To deposit thin film layers and coatings on -Semiconductors -Glass -Polymers -Electronics -Optics -Other Industrial products including food packaging films, metal strips etc. Type: Vertical orientation, Bell Jar Model, Top Opening Design Features: - Ultra-high ultimate vacuum pressure : up to 9.0*10-5 Pa; - Fast heating up devices for a good adhesion; - Robust, compact and solid coating system; - Exclusively induction heating evaporation source design for C60 deposition; - Induction evaporator’s power: RF currency Technical Specifications: Performance 1. Ultimate Vacuum Pressure: better than 9.0*10-5 Pa; - Operating Vacuum Pressure: 6.0*10-4 Pa ~9.0*10-4 Pa; Base Vacuum pressure: 3.0*10-4 Pa 3. Pumping down Time: from 1 atm to 2.0×10-3 Pa≤25 minutes ( room temperature, dry, clean and empty chamber) 4. Deposition source: induction evaporator, crucible 5. Operating Model: Manually 6. Heating: from room temperature up to max. 1000℃,