- Industrial machines and equipment
- Surface Treatment Equipment
- Shanghai Royal Technology Inc.
- Company
- Products
- Catalogs
- News & Trends
- Exhibitions
Rotary sputtering cathode RTSP-PS
Add to favorites
Compare this product
Description
Magnetron Sputtering Sources Specifications
Key Features
1. Finite element magnetic field design
2. Magnet isolated from cooling water
3. Compatible with DC/MF and RF Powers
4. High target utilization
5. Adjustable ejecting direction
6. High power density and excellent uniformity
7. Balanced and unbalanced mode choice
Catalogs
No catalogs are available for this product.
See all of Shanghai Royal Technology Inc.‘s catalogsOther Shanghai Royal Technology Inc. products
Vacuum Coater Components
Related Searches
- Coating machine
- Vacuum deposition machine
- PVD deposition machine
- Thin-film deposition machine
- Metalized film deposition machine
- Arc evaporation deposition machine
- Thermal evaporation deposition machine
- Deposition machine for the microelectronics industry
- Automotive deposition machine
- Glass coating deposition machine
- Sputtering coating machine
- CVD deposition machine
- Short-cycle deposition machine
- Ion beam-assisted deposition machine
- Online deposition machine
- Deposition machine for photovoltaic applications
- Medical deposition machine
- Deposition machine with rotating cathodes
- Laboratory coating machine
- Optoelectronic deposition machine
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.