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Sputtering coating machine optical
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Characteristics
- Options
- sputtering
- Applications
- optical
Description
·Plasma and graphite target pretreatment to effectively improve theadhesion of the thin film layers;
·Dual sputtering process chambers, ensuring coating time is reducedby half compared to single chamber and enables shorter cycle time;
·Multiple sets of sputtering targets to realize high-efficiency depositionof various materials;
·Stepless adjustable of spacing between multiple evaporation boats,fine-tuning of ES distance and precise controlling of dosing volume insyringe pump to ensure anti-oil performance of the product;
·Large diameter coating drum design combined with customizedsubstrate hanging solution, significantly improves throughput;
·Automatic handling of substrate loading & unloading, integrated withdoor valve and track safety detection, guarantees safe operation.
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.