X-ray photoelectron spectrometer XPS

laboratoryfor surface treatmentfor spectroscopy

Overview
X-ray photoelectron spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA), is a mature surface analysis technique for materials characterization. XPS provides quantitative elemental and chemical-state information from the uppermost ~10 nm of material. The Kratos AXIS Nova photoelectron spectrometer collects XPS spectra and images from materials that are stable under the ultra-high vacuum conditions required by the technique.

Performance
Designed for efficient laboratory and production use, the AXIS Nova features automated sample loading, orthogonal cameras for rapid sample positioning and intuitive acquisition software. A 110 mm diameter sample platen enables handling of large samples and high sample throughput without compromising spectroscopic sensitivity, energy resolution or spatial imaging performance.

Features

• Sensitivity – Efficient photoelectron collection for high sensitivity in spectroscopy and XPS imaging modes.
• Resolution – Excellent spectroscopic energy resolution for accurate measurement of small chemical shifts.
• Simplicity – Uses ESCApe acquisition, processing and reporting software common to Kratos instruments for consistent workflows.
• Parallel XPS imaging – Enables mapping of elemental and chemical distribution across surfaces.
• Automation – Automated sample handling and predefined workflows to increase throughput and repeatability.
• Additional capabilities – Extendable system: optional ultraviolet He‑discharge lamp for UPS (valence band and work function measurements) and other analytical modules.

Applications (selected)

• Coatings and thin films
• Polymers and surface treatments
• Arn+ gas cluster sputter depth profiling of cross‑linked plasma polymers
• Analysis of drug‑coated polymer stents
• Combinatorial thin film systems — group array analysis

Technical specifications

• Technique: X-ray photoelectron spectroscopy (XPS) / ESCA
• Analysis depth: information from the uppermost ~10 nm of material
• Sample platen diameter: 110 mm (large sample handling)
• Sample handling: automated sample loading
• Positioning: orthogonal cameras for easy sample alignment
• Imaging: parallel XPS imaging with high spatial resolution
• Sensitivity and resolution: high sensitivity and excellent energy resolution
• Software: ESCApe acquisition, processing and reporting
• Options: Ultraviolet He‑discharge lamp for UPS (valence band and work function measurements)