Ion source DC

6cm x 30cm DC Ion Source Linear Source for Large/Wide Substrates or Large Substrate Batches Veeco's proven linear gridded DC Ion Sources are ideal for highly uniform, reliable ion beam deposition process platforms utilizing large/wide individual substrates or large substrate batches. They are an excellent resource for either linear or cylindrical fixturing. Features the same innovative design, quality and reliability as Veeco's world-class round ion beam sources Provides uniform plasma and high-current density Supports a wide beam energy range of 50 to 2000 eV with nominal beam currents per source up to 500 mA Power supply options allow beam currents up to 800 mA