Chamber furnace

vacuumautomaticindustrial

Furnaces Our furnaces are fully automated with convenient tools and design for both processes with different controllable heating zones completely according to customers capabilities and needs. Our equipments are for these wafer types with the diameters of 100, 150, 200, 300 mm. VACUUM FURNACES Vegatec designs and manufactures vacuum furnaces with all its automation system for laboratory and industry of microelectronics, nanoelectronics and photovoltaics. These furnaces are as follows; Low Pressure Chemical Vapour Deposition (LPCVD) Processes are; Silicon Nitride TEOS Oxide Low Temperature Oxide (LTO) High Temperature Oxide (HTO) Doped Polysilicon Silicon Oxinitride Polysilicon Silanisation Plasma Enhanced Chemical Vapour Deposition (PECVD) Processes are; Silicon Oxide Silicon Nitride Silicon Oxinitride Phosphorus and Boron Doping Vacuum Annealing General Features of Vacuum Furnaces Easy to use and easy to maintenance thanks to user friendly design Furnace chamber and cantilever type sample holder made of high purity quartz Able to work in up to class 10 clean rooms Ability of working under vacuum down to 10-6 Long life time thanks to high quality components Separately controllable heating zones Easy usage of automation interface Stackable furnace tubes for compact design of different processes at the same time Ability of manually or automatically loading Capacity according to each customer Laboratory or industrial scale