ECR Ion Source Hexapole Permanent Magnet is a Halbach-structured six-pole permanent magnet assembly designed to generate a strong, uniform radial magnetic field at the plasma cavity inner wall, meeting field-strength requirements for stable multi-charge-state ion beam production.
Design principle- Halbach six-pole arrangement to produce a concentrated, uniform radial field in the working aperture.
- Selection of high-performance NdFeB permanent magnets (examples: N45, N50M) for high remanence and coercivity to ensure magnetic stability.
- Dimensional optimization (inner/outer diameters, thickness, sector layout) targeting field uniformity at the reference radius R = 50 mm and reduction of higher-order field components.
Product features- Stable magnetic performance through material and geometric optimization.
- Field strength tailored to ECR ion source requirements at the plasma cavity inner wall.
- Customization options for geometry, magnet grade and thermal considerations according to customer specifications.
- Suitable for small and medium multi-charge-state ion beam experimental platforms and ion implantation systems.
Magnetic field simulation and installation- Magnetic simulation using advanced tools (examples: POISSON, PERMAG, TOSCA) to compute field distribution and support design choices.
- Professional assembly, installation and commissioning procedures to ensure accurate alignment and long-term stability; operation and maintenance guidelines provided.
Characteristics / technical specifications- Magnet type: Halbach-structured hexapole permanent magnet assembly.
- Magnet materials: NdFeB (e.g., N45, N50M).
- Design evaluation point: radial reference R = 50 mm (field uniformity and intensity optimized at this radius).
- Simulation tools: POISSON, PERMAG, TOSCA.
- Typical applications: ECR ion sources for multi-charge-state ion beam generation, ion implantation machines, and related small/medium experimental platforms.
- Customization: geometry, material grade and thermal/temperature considerations available upon request.