Plasma source for surface treatment (PVD, CVD) Jeol
The use of plasma for enhancing the quality and function of thin film production by physical vapor deposition (PVD) and chemical vapor deposition (CVD) is becoming indispensible. The Built-in Plasma Source is compact, and can be easily employed in the plasma assisted vapor deposition process.
Features:
- Thermal cathode arc discharge
- Two types of output beams
- reflected beam
- irradiation beam
