X-ray photoelectron spectrometer (XPS) OMICRON

The NanoESCA offers up to 10 times better XPS image resolution, faster acquisition times, small spot spectroscopy with excellent energy resolution, and overview images with 100 times better resolution than presently commercially available instrumentation. For its revolutionary design the NanoESCA received the 2007 R&D 100 award (www.rdmag.com).
Significant technical development often requires thinking out of the box. Lateral resolution of conventional technologies for imaging XPS, be it scanning an x-ray beam or using magnetic lenses, has been stuck for many years at sub 10 µm. It was all too apparent that tweaking these technologies would not be sufficient to reach the resolution required for nanotechnology. This barrier is breached by the new, patent-protected (EP 1559126 US 7,250,599) NanoESCA. The design includes a non-magnetic, electrostatic PEEM lens and a double-pass hemispherical analyser. Rapid PEEM survey imaging (< 50 nm resolution) can be used to locate features, whilst its lateral resolution in imaging ESCA of 650 nm in the laboratory and 150 nm at the Synchrotron are simply unique.

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