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... Product
Full-
automatic wafer exposure system (
mask
aligner) for LED chip production. Compatible with Micro LED and standard LED wafers; available in two combined-size versions for 2–4 in and ...
SEIWAOPTICAL
... b>Overview
This wafer exposure (
mask
aligner) integrates an original UV optical system optimized for high‑definition exposure and a precision mechanism to parallelize photomask and wafer. The Full
Automatic ...
SEIWAOPTICAL
... Overview
- Bench-top wafer exposure system (mask aligner) designed for R&D and small-lot production environments.
- Supports three gap control modes: Hard contact, Soft contact and Proximity
SEIWAOPTICAL
... parallelize photomask and substrate. Fully automatic operation supports vacuum contact, soft contact and proximity gap exposure modes. Vertical and horizontal configurations accommodate different mask sizes: vertical ...
SEIWAOPTICAL
... alignment that is fully automated with sub-micron resolution which delivers performance that is unmatched at any price. The Aligners have Advanced Beam Optics with better than ±3% uniformity and a throughput of 180 ...
... The EVG®620 NT provides state-of-the art mask alignment technology on a minimized footprint area up to 150 mm wafer size. Known for its versatility and reliability, the EVG620 NT provides state-of-the-art mask alignment ...
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