Femtosecond laser system FemtoLux 3

fiberinfraredtunable

FemtoLux 3 is a modern femtosecond fiber laser designed for both research and development as well as industrial integration. It delivers 3 W output power and allows optimization of laser parameters for applications such as marking and volume structuring of transparent materials, photopolymerization, biological imaging, nonlinear microscopy, and more.

Features

• At 1030 nm: 3 W typical output power, up to 3 μJ/pulse and 10 μJ/burst
• At 515 nm: 1.2 W typical output power, up to 1.2 μJ/pulse and 5 μJ/burst
• < 300 fs … 5 ps tunable pulse duration
• M² < 1.2
• Versatile laser control and synchronization capabilities
• Up to 10 MHz pulse repetition rate
• Smart triggering for synchronous operation with polygon scanner and PSO
• Instant amplitude control
• Passive air cooling of the laser head
• 24/7 operation

Applications

• Inner volume marking of transparent materials
• Marking and structuring
• Micromachining of brittle materials
• Photopolymerization
• Ophthalmologic surgery
• Biological Imaging
• Pumping of femtosecond OPO/OPA
• Microscopy

FemtoLux 3 offers tunable pulse duration from 300 fs to 5 ps, adjustable pulse repetition rate up to 10 MHz, and adjustable pulse energy up to 3 μJ, enabling optimization for a wide range of applications. The laser can be equipped with a second harmonics module to further expand its application scope. With burst mode enabled, it can generate bursts of pulses with energy above 10 μJ, significantly improving process efficiency. Its rigid, compact, and passively air-cooled laser head allows integration with various equipment for material micro-processing, microscopy, or other research purposes.

Specifications

• Central wavelength: 1030 nm (fundamental), 515 nm (with second harmonic option)
• Minimal pulse duration (FWHM) at 1030 nm: < 300 fs (typical ~230 fs)
• Pulse duration tuning range: 300 fs – 5 ps
• Maximal average output power: > 3 W at 1030 nm, > 1.2 W at 515 nm
• Power long term stability (Std. dev.): ≤ 0.5 %
• Maximal pulse energy: > 3 µJ at 1030 nm, > 1.2 µJ at 515 nm
• Pulse energy stability (Std. dev.): < 2 %
• Pulse repetition rate (PRR): 1 – 10 MHz
• Pulse repetition frequency (PRF) after frequency divider: PRF = PRR / N, N=1, 2, 3, … , 65000; single shot
• External pulse gating: via TTL input
• Burst mode: 1 – 10 pulses
• Max burst energy: > 10 µJ at 1030 nm, > 5 µJ at 515 nm
• Burst shape control: via analog input
• Power attenuation: 0 – 100 % from remote control application or via analog input
• Polarization orientation: linear, vertical
• Polarization extinction ratio: > 1000:1
• M²: < 1.2
• Beam divergence (full angle): < 1.0 mrad
• Beam ellipticity (far field): > 0.85
• Beam pointing stability (pk-to-pk): < 30 µrad
• Beam diameter (1/e²) at 20 cm from laser aperture: 2.0 ± 0.3 mm at 1030 nm, 1.0 ± 0.2 mm at 515 nm
• Cooling of the laser head: air, passive
• Laser head size (L×W×H): 459.5 × 362 × 111 mm at 1030 nm, 615.3 × 362 × 139 mm at 515 nm
• Power supply unit size (L×W×H): 496 × 483 × 184 mm (stand-alone), 548 × 483 × 184 mm (19″ rack mountable)
• Umbilical length: 5 m
• Mains requirements: 100 – 240 V AC, single phase 47 – 63 Hz
• Maximal power consumption: < 500 W
• Operating ambient temperature: 15 – 30 °C
• Relative humidity: 10 – 80 % (non-condensing)
• Air contamination level: ISO 9 (room air) or better
• Classification according EN60825-1: CLASS 4 laser product