The NanoFlux AWG series are temporally shaped high energy Nd:YAG lasers designed for advanced scientific and industrial applications. The main feature of these lasers is the ability to shape output pulses temporally, achieved through an electro-optical modulator driven by a programmable arbitrary waveform generator (AWG).
Features- High energy nanosecond lasers
- Temporally shaped pulses
- Up to 10 J pulse energies
- 10 Hz pulse repetition rate
- Arbitrary waveform generator for pulse shaping
- 0.15 – 500 ns adjustable pulse duration
- Excellent pulse energy stability
- Cost effective flash lamp pumped power amplifier
- Optional temperature stabilized harmonics options
- Super-Gaussian beam profile
Applications- OPCPA pumping
- Front end for power amplifiers
- Ti:Sapphire pumping
- Laser peening – material hardening by laser-induced shock wave
- Plasma and shock physics
DescriptionThe NanoFlux AWG laser system starts with a single-mode CW laser, which is amplified in a fiber amplifier. The AWG-driven modulator transmits pulses of the required temporal shape and duration, which are further amplified by a diode-pumped regenerative amplifier or an all-in-fiber amplifier to reach energies sufficient for single-pass diode and flash lamp pumped amplifiers. Pulse shaping resolution is 125 ps, with a maximum pulse length of 500 ns. The system uses linear amplifiers for high energy nanosecond pulses, with spatial beam shaping to achieve a flat top beam profile. Angle-tuned non-linear crystal harmonic generators in temperature stabilized heaters are used for second, third, and fourth harmonic generation, with a harmonic separation system ensuring high spectral purity.
Options- – G: Provides a Gaussian-like beam profile (pulse energies typically lower by 80% compared to standard version)
- – AW: Water-air cooling option
- – N20…N500: Extended AWG pulse durations (output energies, especially for SHG output, are specified for one pulse duration with square temporal pulse shape)
Specifications- Models: NanoFlux N2k10-AWG, NanoFlux N5k10-AWG, NanoFlux N10k10-AWG
- Output energy at 1064 nm: 1500 mJ (N2k10-AWG), 5000 mJ (N5k10-AWG), 10 000 mJ (N10k10-AWG, 2 × 5 000 mJ)
- Output energy at 532 nm: 1000 mJ (N2k10-AWG), 3000 mJ (N5k10-AWG), 6000 mJ (N10k10-AWG)
- Output energy at 355 nm: inquire for all models
- Pulse repetition rate: 10 Hz
- Pulsed duration: 0.15 – 20 ns (variable in steps of 125 ps; standard adjustability 1–20 ns; pulse shaping possible 1–500 ns)
- Pulse energy stability at 1064 nm: ≤ 0.5 %
- Pulse energy stability at 532 nm: ≤ 1 %
- Long-term power drift: ± 2 %
- Beam spatial profile: Super-Gaussian
- Beam diameter: ~11 mm (N2k10-AWG), ~25 mm (N5k10-AWG, N10k10-AWG)
- Beam pointing stability: ≤ 50 µrad
- Beam divergence: ≤ 0.5 mrad
- Optical pulse jitter: < 50 ps
- Linewidth: single-mode
- Polarization: linear, > 90 % (N2k10-AWG, N5k10-AWG), linear (N10k10-AWG)
- Laser head size (W×L×H mm): 750 × 1350 × 300 (N2k10-AWG), 700 × 2100 × 300 (N5k10-AWG), 1000 × 2100 × 300 (N10k10-AWG)
- Power supply size (W×L×H mm): 550 × 600 × 840 – 1 unit, 550 × 600 × 670 – 1 unit (N2k10-AWG); 550 × 600 × 1220 – 2 units (N5k10-AWG); 550 × 600 × 1220 – 2 units, 550 × 600 × 670 – 1 unit (N10k10-AWG)
- Umbilical length: 5 m
- Power requirements: 208, 380 or 400 V AC, three phase, 50/60 Hz
- Power consumption: ≤ 6 kVA (N2k10-AWG), ≤ 9 kVA (N5k10-AWG), ≤ 13 kVA (N10k10-AWG)
- Water supply: ≤ 5 l/min, 2 Bar, max 15 °C (N2k10-AWG); ≤ 8 l/min, 2 Bar, max 15 °C (N5k10-AWG); ≤ 12 l/min, 2 Bar, max 15 °C (N10k10-AWG)
- Operating ambient temperature: 22 ± 2 °C
- Storage ambient temperature: 15 – 35 °C
- Relative humidity (non-condensing): ≤ 80 %
- Cleanness of the room: ISO Class 7
Note: Laser must be connected to mains electricity at all times. If disconnected for more than 1 hour, a warm-up period of a few hours is required before switching on.