Semiconductor stripper Microstrip® series

photosensitive resin

FUJIFILM’s family of photoresist strippers provide processing choices and performance advantages over current industry standards for both Aluminum & Copper technology. These materials are used for wet removal of bulk and thick plating photoresist in single wafer and batch processes. Product Lineup Positive and negative Photoresist Removal and Post etch residue remover. DMSO based Microstrip™ 3001 : broadly applicable bulk photoresist stripper Microstrip™ 3200 : mild acidic, amine-free stripper with excellent metal compatibility Microstrip™ 6800 : single wafer tool applicable photoresist stripper with improved cleaning performance on heavily cross-linked photoresist Microstrip™ 6310: Heavy duty Cu compatible photoresist stripper Microstrip™ 6365: Heavy duty photoresist stripper widely compatible with various metals, including Al and Cu Strippers for Negative Photoresist Removal Microstrip™ V Stripper for Positive and Negative Photoresist Removal Gensolve 470 Featuress & Benefits FUJIFILM’s photoresist strippers are designed for optimal performance, low cost of ownership and minimal environmental and health impact Packaging options: 4 x 4L bottles 1 x 20L jerricans 200L drums (one way and returnable) 1000L IBC’s