Cleaning stripper FUJIFILM’s

for semiconductorsheavy-dutyfor metal

Overview
Solvent-based strippers for positive and negative tone photoresist removal. FUJIFILM’s family of photoresist strippers provide processing choices and performance advantages over current industry standards for both Aluminum & Copper technology. These materials are used for wet removal of bulk and thick plating photoresist in single wafer and batch processes.

Product Lineup

• Positive and negative Photoresist Removal and Post etch residue remover.
• DMSO based
  • Microstrip™ 3001: broadly applicable bulk photoresist stripper
  • Microstrip™ 3200: mild acidic, amine-free stripper with excellent metal compatibility
  • Microstrip™ 6800: single wafer tool applicable photoresist stripper with improved cleaning performance on heavily cross-linked photoresist
  • Microstrip™ 6310: Heavy duty Cu compatible photoresist stripper
  • Microstrip™ 6365: Heavy duty photoresist stripper widely compatible with various metals, including Al and Cu
• Strippers for Negative Photoresist Removal
  • Microstrip™ V
• Stripper for Positive and Negative Photoresist Removal
  • Gensolve 470

Features & Benefits

• Designed for optimal performance with formulations that reduce environmental and health impact where possible.
• Packaging options:
  • 4 x 4L bottles
  • 1 x 20L jerricans
  • 200L drums (one way and returnable)
  • 1000L IBCs

Technical specifications

• Product type: Solvent-based photoresist strippers for positive and negative tone resists
• Applications: Wet removal of bulk and thick plating photoresist; single wafer and batch processes
• Metal compatibility: Designed for Aluminum & Copper technologies (Cu and Al compatible variants available)
• Chemistry highlights: DMSO based formulations and variants with mild acidic, amine-free chemistries
• Available product models: Microstrip™ 3001, Microstrip™ 3200, Microstrip™ 6800, Microstrip™ 6310, Microstrip™ 6365, Microstrip™ V, Gensolve 470
• Packaging: 4 x 4L bottles, 1 x 20L jerricans, 200L drums (one way and returnable), 1000L IBCs
• Designed benefits: Improved cleaning performance on heavily cross-linked photoresist (select grades), optimized for process compatibility with Al and Cu