Overview FUJIFILM Electronic Materials offers a comprehensive range of TMAH-based developers for positive and negative photoresist systems. Available as Ready-to-Use (RTU) and concentrated formulations, the product line supports immersion and in-line track development for semiconductor manufacturing.
Product Lineup- Ready-to-Use (RTU) Developers
- Developer without surfactant (TMAH 2.38 wt%)
- Developer with surfactant (TMAH 2.38 wt%)
- Concentrated Products
- TMAH 24.9% concentrate (requires customer dilution)
- 10% TMAH with surfactant (preblended concentrate for dilution)
- Model Examples
- OPD 262 — surfactant-free developer
- OPD 4262 — developer with broad-compatibility surfactant
- OPD 4280 — developer with broad-compatibility surfactant
- WNRD — negative resist developer
Features & Benefits- Multiple purity grades including ultra-high purity options for advanced semiconductor and EUV applications
- RTU and concentrate formats to support both standard and on-site dilution workflows
- Compatible with immersion and in-line track development systems
- Surfactant options available to match resist and process requirements
- Bulk and concentrate supply for high-volume manufacturing
Packaging & Delivery- 1000 L totes (one-way or returnable)
- 200 L drums (one-way or returnable)
- Bulk delivery (location dependent)
- 4 x 4 L bottles
Technical Specifications- Chemical base: TMAH (tetramethylammonium hydroxide)
- Product types: RTU (e.g., TMAH 2.38 wt%) and Concentrates (e.g., 24.9% TMAH; 10% TMAH with surfactant)
- Applications: positive and negative resist systems; immersion and in-line track development; EUV compatible
- Surfactant: available with or without surfactant
- Purity grades: standard to ultra-high purity
- Delivery options: concentrate, bulk, drums, totes, small bottles
Ordering & Support- Custom packing and dilution support available for high-volume customers
- Contact FUJIFILM Electronic Materials for samples, technical data sheets and regulatory information