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Photosensitive resin developer OPD 262

Photosensitive resin developer - OPD 262 - Fujifilm NDT Systems
Photosensitive resin developer - OPD 262 - Fujifilm NDT Systems
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photosensitive resin

Description

Comprehensive range of Metal Ion Containing (MIC) & Metal Ion Free (MIF) developers for positive and negative resist systems FUJIFILM Electronic Materials provides both Ready-to-Use (RTU) and concentrated Positive Developers for advanced positive photoresist systems, suitable for immersion and in-line track development. Product Lineup Positive Developers are TMAH based developers with multiple quality grade levels including ultra-high purity grade for advanced semiconductor applications. Products are available with or without surfactant and can also be purchased in concentrate for customers with on-site blending capability. Ready-to-Use Products Developer without surfactant (TMAH 2.38wt%) Developer with surfactant (TMAH 2.38wt%) Concentrated Products (requires dilution by customer) TMAH 24.9% Concentrate 10% TMAH with surfactant*1 *1 Concentrated TMAH and surfactant preblended for dilution by customer Features & Benefits High Purity options for advanced semiconductor applications Concentrate and bulk delivery options for high volume manufacturing EUV applications Packaging Options 1000L Totes (one-way or returnable) 200L Drums (one-way or returnable) Bulk Delivery (depends on location) 4 x 4L Bottles

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.