Photosensitive resin ArF

for semiconductors

Materials for positive dry and immersion imaging, and negative tone imaging (NTI) Features & Benefits Wide array of high resolution imaging systems for 193 nm exposure including positive dry and immersion imaging and negative tone imaging (NTI) • High throughput • Superior resolution • Wide process windows • Low defect levels • Vertical profiles • GAR series The products in the GAR series are suitable for a variety of applications that require 193nm dry exposure. • FAiRS Series for PTI (positive tone imaging) The products in the FAiRS series are suitable for a variety of applications that require 193nm immersion exposure and positive tone imaging. • FAiRS Series for NTI (negative tone imaging) The products in the FAiRS series are suitable for a variety of applications that require 193nm immersion exposure and negative tone imaging.