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Dissolution solvent RER seriescleaningalcohol basedfor electronics
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Characteristics
- Function
- dissolution, cleaning
- Composition
- alcohol based
- Applications
- for electronics, for laboratory, for PCB
Description
Overview
Broad range of specialty solvent blends designed for photoresist edge bead removal (EBR), rework, rinse and pre-wet applications. Fujifilm supplies ultra-high purity solvents and custom blends to meet stringent lithography requirements for particle, trace metal and organic contamination control.
Product Lineup
Features & Benefits
Technical specifications
Broad range of specialty solvent blends designed for photoresist edge bead removal (EBR), rework, rinse and pre-wet applications. Fujifilm supplies ultra-high purity solvents and custom blends to meet stringent lithography requirements for particle, trace metal and organic contamination control.
Product Lineup
- Alcohols and ketones
- Methanol
- Acetone
- MEK
- Ethanol
- IPA
- MIBC
- MIBK
- Cyclopentanone
- Cyclohexanone
- Acetates, lactones and ethers
- PGME
- PGMEA
- GBL
- EL
- nBA
- EUV solvents and custom blends
- EUV-specific solvents and customer-specific formulations (consult your Fujifilm Account Manager)
Features & Benefits
- Ultra-high purity grades to reduce defects and contamination
- EUV-optimized solvents for improved patterning control and reduced resist swelling
- Custom processing support and tailored solvent blends
- Advanced analytical testing to ensure product purity and consistency
- Regionalized manufacturing and packaging in US, Europe and Asia
- Packaging options:
- 1L–4L glass bottles
- NOWPak
- Drums: stainless steel, PFA, HDPE
- IBC: stainless steel, PFA, HDPE
- ISOtainer
Technical specifications
- Brand: Fujifilm
- Product name / series: NTI Developers
- Intended applications: Edge Bead Removal (EBR), rework, rinse, pre-wet applications for photoresist processes
- Chemical families available: alcohols, ketones, acetates, lactones, ethers, EUV-specific solvents
- Representative chemistries: Methanol, Acetone, MEK, Ethanol, IPA, MIBC, MIBK, Cyclopentanone, Cyclohexanone, PGME, PGMEA, GBL, EL, nBA
- Purity/quality: ultra-high purity grades; products meet global standards for particles, trace metals and organic contaminants
- Customization: custom solvent blends and processing support available
- Manufacturing & packaging: regionalized manufacturing (US, Europe, Asia); packaging options include glass bottles (1–4 L), NOWPak, drums (stainless steel, PFA, HDPE), IBC (stainless steel, PFA, HDPE), ISOtainer
- Analytical assurance: use of state-of-the-art analytical tools to verify purity and quality
- Trademark note: NOWPak is a trademark or registered trademark of Entegris, Inc. in the United States and/or other countries
Catalogs
No catalogs are available for this product.
See all of Fujifilm NDT Systems‘s catalogsExhibitions
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Semiconductor Materials
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.
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