Cleaning solvent RER series

for electronics

Broad range of specialty solvent blends for resist Edge Bead Removal (EBR), rework, rinse & pre-wet applications. Ultra-pure solvents for advanced lithography pre-wet applications Today's critical photoresist applications demand precision stripping, removal and rinse characteristics Therefore, we have developed a complete line of EBR solutions that provides world-class edge bead removal while maintaining the industry standard for purity, packaging, and environmental protection Fujifilm has a wide range of solvents available to suit all applications. Our products are manufactured in state-of-the-art facilities and meet the highest global quality standards for particles, trace metals, and organic contaminants. In addition to straight solvents Fujifilm also support custom blends for unique or customer specific applications. Product Lineup Alcohols and ketones: (Methanol, Acetone, MEK, Ethanol, IPA, MIBC, MIBK, Cyclopentanone, Cyclohexanone) Acetates, Lactones, Ethers: (PGME, PGMEA, GBL, EL, nBA) EUV Solvents and Custom Blends (see your Fujifilm Account Manager) Features & Benefits Ultra-high purity solvents for defect reduction Advanced EUV solvent for high patterning precision and reduced resist swelling characteristics Custom processing and blends State-of-the-art analytical tools used to assure product purity and quality. Regionalized sourcing: US, Europe and Asia manufacturing and packaging Packaging options : 1L-4L Glass bottles NOWPak Drums: Stainless Steel, PFA, HDPE IBC: Stainless Steel, PFA, HDPE ISOtainer NOWPak is a trademark or registered trademark of Entegris, Inc. in the United States and/or other countries.