Semiconductor resin GKR

high-resistancephotosensitivehigh thermal stability

Overview
Positive-tone KrF photoresists for a broad range of semiconductor patterning applications. The GKR series provides multiple grades from high-thickness films to high-resolution formulations to suit different process requirements.

Product Lineup
GKR series families:

• GKR-46xx/32xx series (for implant)
• GKR-53xx series (for C/H)
• GKR-63xx series (for L/S)

Related Products

• EUV (13.5 nm) — EUV materials for negative-tone imaging
• NIL (Nanoimprint Lithography) — NIL materials for semiconductor lithography processes
• ArF (193 nm) — Materials for positive dry and immersion imaging, and negative-tone imaging (NTI)
• i-Line, g-Line and Broadband — Mid-UV photoresists covering sub-0.30 µm to >1.0 µm resolution
• Negative (polyisoprene-based) — Series of negative-tone, polyisoprene-based resist systems
• e-Beam — Positive and negative-tone resists for various e‑beam applications

Features / Technical specifications

• Wavelength: 248 nm (KrF)
• Tone: Positive
• Main product family: GKR series
• Available variants: GKR-46xx/32xx (implant), GKR-53xx (C/H), GKR-63xx (L/S)
• Product range includes high-thickness films and high-resolution formulations to address varied process requirements