Semiconductor resin i-Line

for electronic applicationsphotosensitivehigh-performance

Overview
Mid-UV sensitive photoresist series formulated for patterning across a wide range of resolutions (sub-0.30 µm to >1.0 µm) and film thicknesses on reflective, non-reflective and highly reflective substrates.

Product Lineup

• i-Line resists for non-reflective substrates
  Resist families for critical CD printing on non-reflective substrates:
  • OiR 620 series
  • OiR 674 series
• i-Line resists for reflective substrates
  Series with fast photospeed options for advanced resolution on reflective substrates:
  • OiR 674 series
  • GiR 1102 series
• Multi-purpose high-resolution i-Line resists
  Series offering fastest photospeed options for high throughput and high-resolution patterning:
  • GiR 2700 series
  • OiR 305 series
  • OiR 906 series
  • OiR 907 series
• Cross-over g- and i-Line & broadband resists
  Resists suitable for g-line, i-line and broadband patterning (>800 nm CD):
  • HiPR 6500 series
  • HPR 510 series
• Dyed resists for highly reflective substrates
  Non-bleaching formulations providing high optical density for CD and notching control:
  • OiR 906HD
  • OiR 305HC
  • HiPR 6500GH
  • HiPR 6500HC
• i-Line resists for thicker applications
  Series designed for thicker film patterning (3–13 µm):
  • FHi-560EP
  • GiR 3114
  • OiR 305
  • OiR 908

Features & Benefits
Comprehensive mid-UV resist options supporting critical and non-critical CD ranges, multiple substrate types and wide film-thickness windows, with selectable photospeed and resolution trade-offs per series.

Technical specifications

• Sensitivity: mid-UV (i-line / g-line / broadband)
• Target resolution: sub-0.30 µm to >1.0 µm depending on series
• Substrate compatibility: non-reflective, reflective and highly reflective substrates
• Representative series: OiR 620, OiR 674, GiR 1102, GiR 2700, OiR 305, OiR 906, OiR 907, HiPR 6500, HPR 510, OiR 906HD, OiR 305HC, HiPR 6500GH, HiPR 6500HC, FHi-560EP, GiR 3114, OiR 908
• CD and notching control for highly reflective substrates (dyed series)
• Film-thickness range for thick applications: 3 µm to 13 µm
• Options for fast photospeed and high-resolution (>500 nm CD) depending on series