Semiconductor resin i-Line

photosensitive

Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution on varied substrates over a large range of resist thickness. Product Lineup Advanced i-Line Resists for Non-reflective Substrates Resist families designed for demanding critical CD (350 nm CD) patterning on reflective substrates : OiR 674 series GiR 1102 series Multi-purpose High Resolution i-Line Resists Resist series offering fastest photospeed options for high throughput, high resolution (>500 nm CD) and robust patterning: GiR 2700 series OiR 305 series OiR 906 series OiR 907 series Multi-purpose Cross-over g- and i-Line Resists Resist series offering robust patterning for g-line, i-line and broadband (>800 nm CD): HiPR 6500 series HPR 510 series Dyed Resists for Highly Reflective Substrates Resist series offering non-bleaching, high optical densities for CD and notching control on highly reflective substrates: OiR 906HD OiR 305HC HiPR 6500GH HiPR 6500HC i-Line Resists for Thicker Applications Resist series for thicker film patterning needs ranging from 3 to 13 µm film thickness: FHi-560EP GiR 3114 OiR 305 OiR 908