PVD deposition machine HD500

PVD deposition machine - HD500 - GUANGDONG HUASHENG
PVD deposition machine - HD500 - GUANGDONG HUASHENG
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Characteristics

Method
PVD

Description

Product overview
The HD500 is built on a composite coating technology platform that integrates high-ionization magnetron sputtering (HiPIMS) and multi-arc ion plating in a single process framework. It produces versatile thin films adapted to hard-to-coat materials such as stainless steel and titanium alloys, contributing to extended component service life. The system is suitable for small-scale production and process development.

Key advantages
  • Lateral etching with hot-filament ion source: delivers uniform lateral etch, controlled overhang and simplified maintenance.
  • Composite HiPIMS magnetron sputtering: DC + HiPIMS magnetrons achieve high deposition rates while providing required ion energy for refractory elements (Nb, B, C, W, V) and a wide range of coating materials.
  • Plasma-optimized multi-arc source: three groups of six circular multi-arc targets with concealed arc ignition for reliable operation and easy maintenance; enables multi-element and multi-layer deposition with smooth film surfaces and high target utilization.
  • Multiple deposition platforms on one frame: DC MS + HiPIMS MS + multi-arc ion plating allow single, composite and mixed coating processes within the same batch.


Product Parameters
Name: HD500
Coating technology: Composite coating technology (high-ionization sputtering + arc composite)
Etching: Lateral ion source (hot filament)
Multi-arc sources (number): 6
Magnetron cathodes (number): 1
Equipment size (mm): 3400 × 1600 × 2600
Chamber volume (m³): 0.7
Effective coating area (mm): Φ410 × 400
Max working temperature (°C): 700
Loading capacity (number of trees): 5
Blade loading (APMT1135): 6000 pcs
Rod blade loading (D4*50L): 1800 pcs
Max loading weight (kg): 300
Shaft diameter: Φ130
Process time (AlTiN): 6-8 h

Technical specifications
  • Model / Series: HD500 (HD Series)
  • Coating technology: Composite high-ionization sputtering + arc
  • Etching method: Lateral ion source (hot filament)
  • Multi-arc sources: 6 (3 groups of 6 circular targets)
  • Magnetron cathodes: 1
  • Equipment dimensions: 3400 mm × 1600 mm × 2600 mm
  • Chamber volume: 0.7 m³
  • Effective coating area: Φ410 × 400 mm
  • Max working temperature: 700 °C
  • Loading capacity: 5 trees
  • Blade loading (APMT1135): 6000 pcs
  • Rod blade capacity (D4*50L): 1800 pcs
  • Max loading weight: 300 kg
  • Shaft diameter: Φ130
  • Typical process time (AlTiN): 6-8 h

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.
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