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Optical microscope C10506-07-06
laboratoryinvertednear-infrared

Optical microscope - C10506-07-06 - HAMAMATSU - laboratory / inverted / near-infrared
Optical microscope - C10506-07-06 - HAMAMATSU - laboratory / inverted / near-infrared
Optical microscope - C10506-07-06 - HAMAMATSU - laboratory / inverted / near-infrared - image - 2
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Characteristics

Type
optical
Technical applications
laboratory
Ergonomics
inverted
Observation technique
near-infrared
Other characteristics
digital camera, high-resolution
Weight

1,100 kg
(2,425.1 lb)

Length

1,200 mm
(47.2 in)

Width

1,654 mm
(65.1 in)

Height

1,541 mm
(60.7 in)

Description

Handles from visible light to near-infrared light with one unit by equipping with a multi-wavelength laser The iPHEMOS®-MPX is a high-resolution emission microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects. iPHEMOS is a registered trademark of Hamamatsu Photonics K.K. (Japan). Features Two ultra-high sensitivity cameras are mountable Coverage of different detection wavelength ranges for emission analysis and thermal analysis allows easy selection of an analysis technique that matches the sample and failure mode. Up to 4 light sources for OBIRCH, DALS, EOP and laser marker are mountable High sensitivity macro lens and up to 10 lenses suitable for each detector sensitivity wavelength High accuracy stage designed for advanced devices Basic display functions Superimposed display/contrast enhancement function The iPHEMOS-MPX superimposes the emission image on a high-resolution pattern image to localize defect points quickly. The contrast enhancement function makes an image clearer and more detailed. Display function Annotations: Comments, arrows, and other indicators can be displayed on an image at any location desired. Scale display: The scale width can be displayed on the image using segments. Grid display: Vertical and horizontal grid lines can be displayed on the image. Thumbnail display: Images can be stored and recalled as thumbnails, and image information such as stage coordinates can be displayed. Split screen display: Pattern images, emission images, superimposed images, and reference images can be displayed in a 6-window screen at once.

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Semiconductor manufacturing support systems

*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.