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Deposition machine T-aSi (Oxidation + a-Si)

deposition machine

deposition machine

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Description

This system is used for in-situ oxide and poly deposition for TOPCon cell which enables the selective capture of electrons by improving its recombination rate. Spec High Throughput: 4,702 wafers/hr (640 wafers/boat) Cycle Time: 49 min Uptime: 97%

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