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ALD deposition machine AlOx
solar

ALD deposition machine
ALD deposition machine
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Characteristics

Method
ALD
Applications
solar

Description

This equipment increases the efficiency by depositing an Al2O3 thin film on the front surface of the wafer of a crystalline solar cell by the thermal Atomic Layer Deposition (ALD) to form a passivation layer. Spec High Throughput: 12,800 wafers/hr (1,600 wafers/boat) Cycle Time: 30 min Uptime: 97%

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.
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