Oxidation furnace LP
cabinet

oxidation furnace
oxidation furnace
Add to favorites
Compare this product
 

Characteristics

Function
oxidation
Configuration
cabinet

Description

This machine is designed to improve the cell efficiency by applying a passivation layer on the front side of the silicon wafer after Edge Isolation and PSG removal. Spec High Throughput: 14,400 wafers/hr (2,400 wafers/boat) Cycle Time: 60min Uptime: 99%

Catalogs

No catalogs are available for this product.

See all of HANWHA MACHINERY‘s catalogs
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.