DescriptionOpen-frame low-profile XY-Rotary stage for wafer handling and precision automated positioning in semiconductor manufacturing. Side-mounted XY drive and large central through-hole on the rotary table provide unobstructed access to the wafer from both sides. Configurable for different apertures and travel ranges.
Key specifications- XY stage model: XY-OF-300x300J
- Rotary stage model: ACR-335UT
- Aperture: 335 mm
- Stroke (X × Y): 300 × 300 mm
- Rotation: unlimited
- Linear resolution: standard 5 µm; optional 1 µm (with linear encoder)
- Rotary resolution: 1 arc-sec
- Load capacity: 20 kg
- Open center (through hole): 20 mm
- Velocity: up to 40 m/s (stepper), up to 80 m/s (servo)
- Angular velocity: 100 rpm
- Drive (XY): Ball screw
- Drive (rotary): Direct drive
- Motor options: stepper, servo, encoder
Performance and options- High-precision positioning with optional 1 µm linear encoder
- Unlimited rotation with 1 arc-sec resolution for fine angular alignment
- Selectable motor and drive configurations to match speed or torque requirements
- Customizable aperture and travel to accommodate different wafer sizes and process tools
Applications- Wafer handling and lithography alignment in semiconductor fabs
- Precision assembly, inspection and metrology
- Automated pick-and-place and testing equipment
Ordering informationStandard configuration includes the listed models and drives. Contact the supplier for custom aperture, travel ranges, encoder options and integration support.