Sputtering coating machine PL711

high-performancemulti-layer

PL711 HiPIMS 3D Unit The PL711 is a compact SPUTTER coating unit based on HiPIMS technology. It’s equipped with two Planar HiPIMS cathodes and allows for the deposition of selected nitride as well as carbon-based coatings using highly productive processes. Efficient plasma utilization is achieved through an additional booster, the PLATIT 3D module. Coatings from the PL711 provide outstandingly smooth surfaces with a high density, hardness and excellent adhesion. 2 x Planar SPUTTER cathode with HiPIMS technology PA3D module with a central anode focusing a dense and homogeneous three-dimensional plasma with a high ionization degree in the carousel Etching technologies applied: LGD® (Lateral Glow Discharge) Plasma etching with argon, glow discharge Metal ion etching (Ti, Cr) Load and cycle times: Max. coating volume: 4 x ø 225 x H 800 [mm] Max. coating height with defined coating thickness: 550 mm Max. load: 250 kg 2 batches/day for*: Shank tools (2 μm): - - ø 10 x 55 [mm], - CrN, 540 pcs., - 11 h Molds and dies (3 µm): up to ø 225 x 140 [mm], - CrN, - 16 pcs., - 10 h Sliding parts (3 µm) - - 25 x 150 x 10 [mm], - DLC2, 96 pcs., - 8 - 9 h * Average cycle times for a typical coating mix in a production environment. Modular carousel systems: 1 or 3 or 6 axes Software: Simple use and maintenance PLATIT’s SmartSoftware (PC and PLC system) Modern control system with touch screen Data recording and real-time display of process parameters and flow Manual and automatic process control Remote diagnostics and maintenance Machine dimensions: Footprint: W 3450 x D 2250 x H 2350 [mm]