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Diamond wire cutting machine GC-SCDW8300
for monocrystalline siliconwaferbar

Diamond wire cutting machine - GC-SCDW8300 - Qingdao Gaoce Technology Co., Ltd. - for monocrystalline silicon / wafer / bar
Diamond wire cutting machine - GC-SCDW8300 - Qingdao Gaoce Technology Co., Ltd. - for monocrystalline silicon / wafer / bar
Diamond wire cutting machine - GC-SCDW8300 - Qingdao Gaoce Technology Co., Ltd. - for monocrystalline silicon / wafer / bar - image - 2
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Characteristics

Technology
diamond wire
Material
for monocrystalline silicon
Product handled
wafer, bar
Applications
for the semiconductor industry
Tube diameter

Max.: 8 in

Min.: 6 in

Overall length

4,880 mm
(192 in)

Maximum width

2,100 mm
(83 in)

Height

3,100 mm
(122 in)

Weight

14,000 kg
(30,864.72 lb)

Description

Product Introduction
This machine is a dedicated multi-wire diamond-wire wafering system for cutting silicon carbide (SiC) ingots. It features an adjustable wheelbase, workpiece oscillation, low kerf loss and reduced wire consumption. Combined with dedicated diamond wire, a high‑precision tension control system and high‑speed cutting technology, it provides stable, high-quality and high-efficiency slicing of 6–8″ × L300 SiC crystals, suitable for industrial wafer production lines.

Key Features
  • Multi-wire diamond-wire cutting designed specifically for SiC ingots
  • Adjustable wheelbase to accommodate different ingot diameters
  • Workpiece oscillation to improve surface finish and reduce chipping
  • Low material kerf loss and reduced diamond wire consumption for cost-effective production
  • High-precision tension control ensures consistent slice thickness and repeatability
  • Supports one-way or two-way wire feeding for process flexibility


Technical Parameters
  • Max. workpiece size: 6–8″ × L300
  • Wire feeding direction: One-way feeding / Two-way feeding
  • Max. wire speed: 3000 m/min
  • Cutting method: Downwards cutting
  • Rapid feed (fast advance/return): 50–500 mm/min
  • Max. swing angle: ±10°
  • Max. wire reserve: 120 Km
  • Dimension (L × W × H): approx. 4880 × 2100 × 3100 mm
  • Equipment weight: approx. 14000 Kg


Applications and Benefits
  • Engineered for high-volume SiC wafer production for power electronics and semiconductor substrates
  • Stable slicing quality reduces downstream processing and improves yield
  • Design suitable for integration into automated industrial production lines
  • Large wire reserve and efficient wire management reduce changeover frequency
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.