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PECVD deposition machine PECVDsilicon thin-film
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Characteristics
- Method
- PECVD
- Deposition type
- silicon thin-film
Description
·The tunnel oxide layer, i-poly, and D-poly layers can be coated in the same furnace tube which helps in reducing the process steps, improving the yield and lowering the breakage rate effectively;
·Without hot wall effects, so quartz tube has a long service life;
·Slight wrap-around deposition which is easy to be removed;
·Precise doping; available to introduce other efficiency-enhancing doping elements, suitable for process expansion and large space for efficiency improvement;
·Patented anti-conduction technology.
Other Shenzhen S.C New Energy Technology Corporation products
Horizontal Furnaces Series
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