Calibration software Calibre® MPCpro

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The Calibre Mask Process Correction family of rule and model-based products is used in advanced photomask manufacturing to correct for systematic mask lithography and process error sources to ensure that the mask critical dimension signature is within specification. Mask process correction validation for multi-beam mask lithography In this paper, we present a full cycle of MPC calibration and verification, using existing, proven mask processes in combination with a novel MBMW system. Calibre Mask Process Correction Products Calibre Mask Process Correction rule and model-based products provide best in class scalability and accuracy to correct error sources from the nanometer to the centimeter range for electron scatter and process loading effects. Advanced modeling tools allow model calibration to <1 nm accuracy.