Chemical pump 333/334 series
electricindustrialmixing

chemical pump
chemical pump
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Characteristics

Fluid
for chemicals
Operation
electric
Domain
industrial
Applications
mixing, for HPLC
Flow

Max.: 0.2 l/min
(0.05283 us gal/min)

Min.: 0.001 l/min
(0.00026 us gal/min)

Pressure

210 bar
(3,045.792 psi)

Description

One preparative pumping solution to accommodate columns ranging from 10 mm to 50 mm ID in high pressure normal and reverse phases at pressures up to 3,040 psi (210 bar). Your delivery solution for preparative chromatography. Capable of fast separations with high-efficiency columns in normal and reverse-phase modes. Choose the 333 Master Pump for isocratic applications or a 333/334 combination for binary gradient applications. - Milligram-to-gram level sample mass throughput per injection; up to 15 g depending on column size and loading capacity - Composition gradient with high-pressure mixing: 333-334 binary system (third pump for ternary). Solvent selection on each pump with addition of four-solvent valve (up to eight solvents) - Ability to operate additional pumps in parallel to double the flow rate up to 400 mL/min - Control from 333 master pump: flow-rate gradient, four-solvent selection and step gradient (additional valve), composition gradient (one or two additional pumps), sample-injection pump, UV/VIS detector and electrical input/output contacts with any other associated equipment - Quiet operation, durable design - Control 33X Pumps and an entire preparative HPLC system via TRILUTION® LC Software - Stackable to conserve bench space

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