AC / DC power supply: voltage rectifier for plasma deposition
1 000 - 8 000 kW | TruPlasma Highpulse 4000 series
Hüttinger Electronik
The TruPlasma Highpulse Series 4000 product family of DC power supplies is the ideal choice for HIPIMS processes. HIPIMS represents the most recent development of PVD pulsed sputtering technology utilizing extremely dense plasmas.
High peak power of up to 8 megawatts generates a highly ionized plasma and enables high ion fluxes. As a result, very coherent and dense films without any droplets can be realised. When in combination with biased substrate configurations, TruPlasma Highpulse 4000 power supplies also provide superior results in etching, pre-treatment and trench-filling applications.
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