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... technology and CombineLine output matching for stable
plasma processes.
Key features
- Smart Auto Frequency Tuning (AFT): fast, optimal frequency matching between generator and matchbox.
- High‑precision
TRUMPF lasers
... ) are bipolar pulse generators designed for plasma-assisted coating processes such as PVD, PECVD and reactive sputtering. They provide configurable, formable output waveforms and fully digital arc management ...
TRUMPF lasers
programmable plasma generatorTruPlasma MW Series 1000 /3000 / 5000
... Overview
Robust solid-state microwave
plasma
generator delivering very high
plasma densities for demanding industrial processes. The TruPlasma MW Series is based on solid-state technology, providing ...
TRUMPF lasers
PC-controllable plasma generatorTruPlasma RF Sériés 1000/3000 (G2/13)
... Applications TruPlasma RF Series 1000 / 3000 (G2/13) generators are designed for plasma processes such as reactive-ion etching (RIE), atomic layer deposition (ALD), plasma-enhanced chemical vapor ...
TRUMPF lasers
... br>
Applications
- Etching and coating processes: plasma etching, reactive ion etching (RIE), atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD).
- Coating
TRUMPF lasers
... heavy or difficult-to-evaporate materials. Supporting both pulsed and bias operation, it delivers stable
plasma performance for critical PVD and
PECVD processes while minimising arc-related downtime and substrate damage.
Tagline
Pulsed ...
TRUMPF lasers
... The TruPlasma Bipolar Series 4000 (G2.1) process power supplies were specifically designed for plasma-assisted coating using PVD, PECVD, and reactive sputtering processes. With their flexible formable output signals and ...
TRUMPF Power electronics
... specially developed for reactive DC sputtering with heavy materials. The generators, which work with pulsed direct current, are particularly well proven in critical PVD and PECVD processes, which require both the highest ...
TRUMPF Power electronics
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