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... technology and CombineLine output matching for stable
plasma processes.
Key features
- Smart Auto Frequency Tuning (AFT): fast, optimal frequency matching between generator and matchbox.
- High‑precision
TRUMPF lasers
... ) are bipolar pulse generators designed for plasma-assisted coating processes such as PVD, PECVD and reactive sputtering. They provide configurable, formable output waveforms and fully digital arc management to ensure ...
TRUMPF lasers
programmable plasma generatorTruPlasma MW Series 1000 /3000 / 5000
... Overview
Robust solid-state microwave
plasma
generator delivering very high
plasma densities for demanding industrial processes. The TruPlasma MW Series is based on solid-state technology, providing ...
TRUMPF lasers
PC-controllable plasma generatorTruPlasma RF Sériés 1000/3000 (G2/13)
... br>
Applications TruPlasma RF Series 1000 / 3000 (G2/13)
generators are designed for
plasma processes such as reactive-ion etching (RIE), atomic layer deposition (ALD),
plasma-enhanced chemical ...
TRUMPF lasers
... without compromises
Overview
With these RF
generators the TruPlasma RF Series 3000 stands out for its robust design and high efficiency. It is suited for stable, reproducible
plasma processes used in ...
TRUMPF lasers
... Overview
The TruPlasma Arc Series 3000 is an arc
plasma
generator family designed for arc cathode processes in demanding industrial environments. The units are suitable for hard‑material and decorative PVD coatings ...
TRUMPF lasers
... Overview
The TruPlasma DC Series 3000 (G2) is a compact water-cooled DC
generator for DC sputtering processes, including replacement of pulsed process power supplies. Progressive arc management ensures excellent layer quality ...
TRUMPF lasers
... The TruPlasma Highpulse Series 4000 (G2) is a HiPIMS generator designed to replace DC sputter sources in existing magnetron systems without hardware changes. Very high peak powers produce extreme plasma densities and ...
TRUMPF lasers
... DC sputtering of heavy or difficult-to-evaporate materials. Supporting both pulsed and bias operation, it delivers stable
plasma performance for critical PVD and PECVD processes while minimising arc-related downtime and substrate damage.
Tagline ...
TRUMPF lasers