Programmable plasma generator TruPlasma Bipolar Series 4000 (G2.1)

for surface coatingindustrialPC-controllable

Overview
The TruPlasma Bipolar Series 4000 (G2.1) are bipolar pulse generators designed for plasma-assisted coating processes such as PVD, PECVD and reactive sputtering. They provide configurable, formable output waveforms and fully digital arc management to ensure stable plasma conditions and reproducible coating results.

Key features

• Fully digital arc management with very low arc energy for improved layer quality.
• Configurable output waveforms to adapt the signal to different processes.
• Support for DC, pulsed DC and bipolar modes to cover multiple use cases.
• Integrated water cooling in the generator housing, eliminating the need for external coolers.

Applications

• PVD, PECVD and reactive sputtering processes.
• Photovoltaics and solar cell production.
• Semiconductor manufacturing.
• Architectural glass coating.
• Decorative and wear‑resistant coatings.

Customer benefits

• Consistent high coating quality and productivity thanks to low arc energy and stable power delivery.
• Process flexibility via adjustable waveforms to meet diverse technical requirements.
• Reduced system footprint and simpler integration due to the integrated water cooler.

Software
PVD Power software (multilingual) enables operation, configuration and diagnosis: live display of process parameters, warnings and alarms, operator entry of nominal values, and high‑resolution recording/visualization (oscilloscope function) for process analysis.

System components

• Available mains and power cables, connectors and accessories to match regional connection standards.
• Options to adapt the generator to the system environment for optimal integration.

Technical specifications

• Product family: TruPlasma Bipolar Series 4000 (G2.1).
• Operating modes: DC, pulsed DC, bipolar.
• Arc management: fully digital, very low arc energy.
• Output signals: configurable/formable waveforms.
• Cooling: integrated water cooling (no external cooler required).
• Target processes: PVD, PECVD, reactive sputtering.
• Typical applications: photovoltaics, semiconductors, decorative and wear‑resistant coatings, architectural glass.
• Software: PVD Power with real‑time display, alarms, recording and oscilloscope function.