RF plasma generator TruPlasma RF Series 3000

PC-controllablehigh-frequencyindustrial

Short description
RF technology without compromises

Overview
With these RF generators the TruPlasma RF Series 3000 stands out for its robust design and high efficiency. It is suited for stable, reproducible plasma processes used in the production of semiconductors, photovoltaic cells, and flat screens. Installed in thousands of applications worldwide, these generators guarantee high productivity and excellent process results.

Key features

• Efficiency of up to 80% enabling significant reduction of energy costs.
• Excellent RF arc management for safe operation of demanding processes.
• CombineLine technology providing protection against reflected power and ensuring high process stability.
• Maximum flexibility with continuous or pulsed power output for diverse applications.
• Robust design with high reliability and long operating times.

Applications

• Etching and coating processes: plasma etching, reactive ion etching (RIE), atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD).
• Coating of metal workpieces: applying wear-protection coatings and structuring electronic components via plasma processes.
• Coating of flat screens and photovoltaic cells: RF sputtering and other plasma-based deposition processes.

Customer benefits
Highest efficiency and process stability: reduced power loss and reduced cooling water requirements enable lower operating costs; CombineLine with true 50 ohm output impedance ensures stable plasma processes.

Safety under all circumstances: robust generator design with 100% mismatch protection for secure operation even under critical loads. Support for optional continuous or pulsed power output to match process requirements.

TRUMPF SystemPort: enables closed-loop control by measuring RF signals at input and output of the matchbox; measured values are available to the generator for better monitoring, matchbox protection, and early arc detection. The RF system can be controlled via a single generator interface.

Options and software

• Arc management modules for targeted arc detection and optimized plasma process control.
• TRUControl Power: user-friendly control software for convenient start-up and secure monitoring of the RF generator or entire TRUMPF RF system.
• Various matchboxes (TruPlasma Match) and RF switches, coaxial cables and other RF system components to create a perfectly matched RF system solution.

System components
The TRUMPF RF System combines generator and matchbox to continually adapt to the variable plasma load, ensuring precise 50 ohm impedance matching. Components are integrated via standard interfaces (including EtherCAT) and can be combined to form optimized system solutions.

Technical specifications

• Efficiency: up to 80% (enabling up to ~50% reduction in energy costs).
• Power output modes: continuous or pulsed output.
• CombineLine technology: protection against reflected power; true 50 ohm output impedance.
• Mismatch protection: 100% mismatch protection for secure operation.
• Typical applications: RIE, ALD, PECVD, RF sputtering, plasma etching and coating.
• Master oscillators available for stabilizing synchronous plasma processes; digital frequency and phase synthesizer, frequency 13.56 MHz and other combinations available.
• SystemPort: closed-loop measurement at matchbox input/output for process monitoring and early arc detection.
• Installed base: tens of thousands of units installed in industrial applications worldwide.
• Control software: TruControl Power (for start-up and monitoring).