Industrial plasma generator TruPlasma RF Air Sériés 1000
for surface coatingPC-controllableprogrammable

Industrial plasma generator - TruPlasma RF Air Sériés 1000 - TRUMPF lasers - for surface coating / PC-controllable / programmable
Industrial plasma generator - TruPlasma RF Air Sériés 1000 - TRUMPF lasers - for surface coating / PC-controllable / programmable
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Characteristics

Type
industrial, for surface coating, PC-controllable, programmable, RF
Other caracteristic
PVD, PECVD

Description

Overview
The air-cooled RF generator TruPlasma RF 1001 Air delivers up to 1000 W of precisely dosed, reproducible RF power with 0.1 W resolution (100 mW steps). Designed for semiconductor, solar-cell and display production, it integrates patented TRUMPF Hüttinger technology and CombineLine output matching for stable plasma processes.

Key features
  • Smart Auto Frequency Tuning (AFT): fast, optimal frequency matching between generator and matchbox.
  • High‑precision arc management: early arc detection and protection for sensitive processes and equipment.
  • Multi‑level pulsing: configurable multi‑stage pulse shapes for advanced process control.
  • Plug & Play modularity: ½‑19‑inch plug‑in form factor for easy replacement and retrofit.
  • True 50 Ω output (CombineLine): consistent process power and reduced sensitivity to load variations.
  • Uniform generator family: same technology across power classes for simplified integration and spare‑part strategy.
  • Independence from RF cable length: no cable‑length adaptation required after system changes.


Applications
  • Reactive‑ion etching (RIE)
  • Atomic layer deposition (ALD)
  • Plasma‑enhanced chemical vapor deposition (PECVD)
  • RF sputtering
  • Production of semiconductors, MEMS, flat‑panel displays and solar cells


Customer benefits & system functions
  • High repeatability: energy dosing in 100 mW increments for wafer‑to‑wafer consistency.
  • Compact, space‑saving design: ½‑19‑inch plug‑in unit suitable for new systems and retrofits.
  • Broad interface set for integration: configurable analogue I/O, Ethernet, DeviceNet, PROFIBUS, EtherCAT.
  • TRUMPF SystemPort support: closed‑loop control, real‑time RF measurement at matchbox in/out, matchbox protection and process monitoring.
  • Digital process functions: AFT 2.0, arc management, multi‑level pulsing for fine adaptation to process requirements.


Technical specifications
  • Power class: up to 1000 W (TruPlasma RF 1001 Air)
  • Power resolution: 0.1 W (100 mW steps)
  • Cooling: air‑cooled
  • Output impedance: true 50 Ω (CombineLine technology)
  • Pulsing: multi‑level, freely selectable pulse shapes
  • Auto frequency tuning: Smart AFT for fast generator–matchbox tuning
  • Form factor: compact ½‑19‑inch plug‑in unit
  • Interfaces: configurable analogue I/O, Ethernet, DeviceNet, PROFIBUS, EtherCAT
  • System control: TRUMPF SystemPort for closed‑loop control and real‑time measurement

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.