High-frequency plasma generator TruPlasma Highpulse Series 4000 (G2)

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Overview
The TruPlasma Highpulse Series 4000 (G2) is a HiPIMS generator designed to replace DC sputter sources in existing magnetron systems without hardware changes. Very high peak powers produce extreme plasma densities and ion fluxes to enable hard, corrosion- and wear-resistant PVD coatings.

Key features

• Peak power up to 4 MW for very high plasma density and ionization.
• Direct adaptation to existing cathode systems and process conditions for easy integration.
• Operable in DC mode; no external DC power supply required.
• Compact single-unit, fully water-cooled design suitable for cleanroom installation.
• Fully digital arc management (e.g., CompensateLine CLC) for low arc energy and reduced film defects.

Applications

• Hard material coatings for corrosion and wear protection of highly stressed components.
• Semiconductor and photovoltaics: tailored process energy, high productivity and stable coating parameters.
• Large-area glass coatings for architectural and industrial glass using PVD plasma processes.
• Etching and trench-filling in combination with polarized substrates to improve layer properties.

Customer benefits & process advantages

• High process stability: adjustable pulse duration and frequency and power regulation maintain consistent deposition parameters, including in reactive processes.
• Drop-free sputtering and minimal film defects thanks to digital arc control with very low arc energy.
• Adjustable pulse parameters and advanced power control increase deposition rates and help reduce total cost of ownership.
• Scalable use from R&D laboratories to large industrial plants due to high energy and voltage capability.

Options

• CompensateLine (CLC) digital arc management for optimized coating quality and deposition rates.
• Process adaptation options to match specific cathode types and applications.

Software

• PVD Power: multilingual operator software for configuration, monitoring and diagnostics; includes real-time parameter display, alarms, operator setpoints and high-resolution recording (oscilloscope function) for process optimization and fault analysis.

Notes
Fully water-cooled compact single-unit design; configurable to specific process requirements and suitable for cleanroom environments.

Technical specifications

• Peak power: up to 4 MW
• Maximum voltage: up to 2 kV
• Pulse duration: up to 5 ms
• Pulse frequency: up to 10 kHz
• Modes: HiPIMS and DC
• Cooling: fully water-cooled
• Unit type: compact single-unit (no external DC supply required)
• Arc management: fully digital (CompensateLine CLC available)
• Software: PVD Power