PECVD plasma generator TruPlasma DC Series 4000 (G2)

PVD

Overview
The TruPlasma DC Series 4000 (G2) pulsed DC power supply is engineered for reactive DC sputtering of heavy or difficult-to-evaporate materials. Supporting both pulsed and bias operation, it delivers stable plasma performance for critical PVD and PECVD processes while minimising arc-related downtime and substrate damage.

Tagline
Pulsed processes for brilliant surfaces

Key features

• Digital signal processing for stable plasma control and reduced arc-related time losses.
• Fast arc handling with low arc energy to minimise substrate damage and surface defects.
• Wide, adjustable pulse frequency range and configurable reverse/bias voltage for flexible process tuning.
• Compact, robust housing with integrated water chiller to save installation space and reduce maintenance.
• Dual functionality: supports both pulsed and bias modes in one unit.

Applications

• Hard coatings: provides a stable plasma for high surface hardness and improved thermal/chemical resistance.
• Metallization (PVD): deposition of ultra-thin, homogeneous metal layers for optical and electrical properties.
• Photovoltaics: suited for TCO and conductive layer deposition with low arc energy requirements.
• Architectural glass: large-area PVD coatings with high process power demands.

Customer benefits

• Improved coating quality and productivity through reduced droplet rate, fewer surface defects and higher deposition rates.
• Process flexibility via adjustable pulse parameters and bias operation to meet diverse application needs.
• Advanced monitoring and diagnostic tools to support process optimisation and reduce downtime.

Options

• Parallel operation and synchronization of multiple generators, including synchronized arc detection and pulse-mode alignment for multi-target systems.

Software
PVD Power: multilingual, user-friendly software for operation, configuration and diagnostics. Displays actual process values, warnings/alarms, allows setpoint specification and records/visualises operating parameters with high temporal resolution (oscilloscope function).

Technical specifications

• Technology: Pulsed DC for reactive DC sputtering; supports bias mode.
• Operation modes: Pulsed mode and bias mode (one unit supports both).
• Arc management: Digital, fast arc handling with low arc energy.
• Process control: Digital signal processing; wide adjustable pulse frequency spectrum; adjustable reverse voltage.
• Cooling: Integrated water chiller for compact installation and reduced maintenance.
• Scalability: Parallel operation and synchronization of multiple units possible.
• Software: PVD Power for operation, configuration, diagnostics and oscilloscope-style data recording/visualization.
• Typical applications: PVD/PECVD hard coatings, metallization (TCO), photovoltaic cell production, large-area architectural glass coatings.