PC-controllable plasma generator TruPlasma RF Sériés 1000/3000 (G2/13)

programmablehigh-frequencyRF

Overview Stable and reproducible plasma power for high-throughput production. The TruPlasma RF Series 1000 / 3000 (G2/13) are RF generators featuring modern power electronics, precise output control and CombineLine matching for a true 50 Ω output impedance.

Main benefits

• High accuracy and reproducibility enabled by CombineLine true 50 Ω output impedance.
• Independence from RF cable length—no cable length adaptation required.
• Protection against reflected power in mismatch conditions for safe operation.
• High energy efficiency—up to 80% efficiency, enabling significant energy cost reduction.
• Blower-free cooling to avoid ambient air heating and contamination, suitable for cleanroom environments.

Applications TruPlasma RF Series 1000 / 3000 (G2/13) generators are designed for plasma processes such as reactive-ion etching (RIE), atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD) and RF sputtering. Typical sectors include semiconductor manufacturing, MEMS, flat-panel coating and photovoltaic cell production.

Customer benefits & system integration

• Intelligent real-time matching provides fast impedance adjustment to 50 Ω and stabilizes plasma behavior.
• Integrated ultra-wide-range power supplies (200–480 VAC) simplify installation across different mains voltages.
• Multiple interfaces for system integration: configurable analog, RS-232/485, DeviceNet, Profibus, EtherCAT.
• Compact high-power form factor available as 19-inch or ½-19-inch plug-in units for space-saving integration.
• TRUMPF SystemPort supports closed-loop control by measuring RF signals at matchbox input/output for improved monitoring and early arc detection.

Options

• Auto Frequency Tuning: patented rapid simultaneous frequency tuning for optimal generator–matchbox interaction.
• RF arc management: targeted arc detection to protect product and equipment and to maximize productivity.

System components & accessories

• TruPlasma Match Series 1000 (G2/13) matchboxes for optimal power transfer; operable standalone or via SystemPort connection.
• Master oscillators: digital frequency and phase synthesizers for stabilizing synchronous plasma processes (e.g., 13.56 MHz).
• RF switches: allow one generator to serve multiple process stations (2/3/4 outputs; different power classes).
• Coaxial cables: TRUMPF Hüttinger 50 Ω coaxial cables designed for RF power transmission.

Notes Product range, specifications and accessory availability may vary by country and are subject to change.

Technical specifications

• Product family: TruPlasma RF Series 1000 / 3000 (G2/13)
• Applicable processes: RIE, ALD, PECVD, RF sputtering
• Typical industries: semiconductor, solar, flat-panel coating, MEMS
• Technology: CombineLine matching to true 50 Ω output impedance
• Efficiency: up to 80%
• Cooling: blower-free (cleanroom compatible)
• Power supply: integrated ultra-wide-range 200–480 VAC
• Form factor: 19-inch or ½-19-inch plug-in unit
• Interfaces: configurable analog, RS-232, RS-485, DeviceNet, Profibus, EtherCAT
• Options: Auto Frequency Tuning, RF arc management
• System features: TRUMPF SystemPort for closed-loop control and early arc detection
• Master oscillator support: 13.56 MHz and other frequency combinations