UV-NIL photolithography system UV/EVG®620 NT

Known for its flexibility and reliability, the EVG620 NT provides state-of-the-art mask alignment technology on a minimized footprint. Operator-friendly software, minimized time for mask and tooling changes, as well as efficient worldwide service support makes them the ideal solution for any R&D environment up to semi-automated volume production. The tool supports a variety of standard lithography processes, such as vacuum-, soft-, hard- and proximity exposure mode the option of back-side alignment. Additionally the system offers additional capabilities for multi-purpose configurations, including bond alignment and nanoimprint lithography. Furthermore, the EVG’s proprietary SmartNIL technology is supported on both semi-automated and fully automated system configurations. SmartNIL is the industry leading NIL technology, enabling the patterning of extremely small features down to less than 40 nm*, as well as a wide range of structure sizes and shapes. SmartNIL in combination with multi-use soft-stamp technology enables unmatched throughput with considerable cost-of-ownership advantages while preserving scalability and maintenance-friendly operation. EVG’s SmartNIL redeems the long-term promise of nanoimprinting being a low-cost and high-volume alternative lithography technology for mass manufacturing of micro- and nanoscale structures. *resolution dependent on process and template