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UV-NIL photolithography system UV/EVG®770

UV-NIL photolithography system
UV-NIL photolithography system
UV-NIL photolithography system
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The EVG770 is a versatile platform for step-and-repeat nanoimprint lithography for efficient master fabrication or direct patterning of complex structures on substrates. This approach allows uniform replication of templates from small dies up to 50 mm x 50 mm over large areas up to 300 mm substrate sizes. In combination with diamond turning or direct writing methods, step-and-repeat imprinting is frequently used to efficiently fabricate masters required for wafer-level optics manufacturing or EVG’s SmartNIL process. Key features of the EVG770 include precise alignment capabilities, full process control and the flexibility to address requirements of a wide variety of devices and applications. Features Efficient master fabrication of microlenses for wafer-level optics down to nanostructures for SmartNIL® Simple implementation of different kind of masters Variable resist dispense modes Live image during dispensing, imprinting and demolding In-situ force control for imprint and demolding Optional optical wedge error compensation Optional automated cassette-to-cassette handling


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