Gas monitoring equipment IR-400

High-grade type Gas Monitor for Chamber Cleaning End Point Monitoring The IR-400 offers real-time monitoring of the chamber cleaning end point during the deposition process. By optimizing the cleaning process, the IR-400 reduces cleaning time and gas usage. This reduction in cleaning gas usage leads to a reduction in chamber damage and increases the life times of all the systems components. Multi gas monitoring (Supported SiF4 andCF4) (IR-422) High sensitivity Gas cell heating function up to 180 dec.C Multi-display Analog/Digital communication. Benefits of real-time end-point monitoring with the IR-400 Reduce time for chamber cleans Reduce usage of cleaning gases Repeatable and predictable clean process Longer lifetime of chamber components