wafer metrology system
The Vertex system brings the PL measurement process under control so that your epitaxial process stays firmly under control.
The latest addition to the industry-standard RPM family, the Vertex system takes a great concept and drives it to its ultimate conclusion. Using a novel, on-board beam profiler, the Vertex system controls the power density by constantly monitoring both the laser power and the focal spot dimensions. This allows the user to adjust the power density to a fixed value eliminating all sources of variation in between tools enabling good tool matching in a production environment. Also, power density control helps the Vertex system deliver highly accurate and repeatable data measurements.